Current state of 300mm lithography in a pilot line environmentCHARLES, A. B; MALTABES, J. G; HORNIG, S. R et al.SPIE proceedings series. 1999, pp 140-153, isbn 0-8194-3479-5Conference Paper

Application of a gas sampling introduction system for inductively coupled plasma spectroscopy and analyses of various plasma gasesMAUTZ, K. E; PARSONS, M. L; MOORE, C. B et al.Applied spectroscopy. 1987, Vol 41, Num 2, pp 219-226, issn 0003-7028Article

Environmental and substrate material factors effect on metal lithography corrosionMAUTZ, K. E.SPIE proceedings series. 1997, pp 220-229, isbn 0-8194-2645-8Conference Paper

The application of ICP spectroscopy to model the chemistry occurring in plasma-etch reactors. IMAUTZ, K. E; PARSONS, M. L; MOORE, C. B et al.Applied spectroscopy. 1989, Vol 43, Num 8, pp 1414-1423, issn 0003-7028, 10 p.Article

Monitoring techniques of corrosive species affecting integrated circuit metal lithographyMAUTZ, K. E.SPIE proceedings series. 1997, pp 429-440, isbn 0-8194-2765-9Conference Paper

Alkali metal ion monitoring and reduction in dielectric oxidesMAUTZ, K. E.SPIE proceedings series. 1997, pp 210-219, isbn 0-8194-2645-8Conference Paper

Plasma reactor etch modeling using inductively coupled plasma spectroscopy diagnostic techniquesMAUTZ, K. E.SPIE proceedings series. 1997, pp 230-240, isbn 0-8194-2645-8Conference Paper

Monitoring and reduction of alkali metal contamination in dielectric oxidesMAUTZ, K. E.SPIE proceedings series. 1997, pp 68-79, isbn 0-8194-2765-9Conference Paper